SOLICITATION NOTICE
36 -- Halide Vapor Phase Etch Tool
- Notice Date
- 8/9/2006
- Notice Type
- Solicitation Notice
- NAICS
- 333298
— All Other Industrial Machinery Manufacturing
- Contracting Office
- RDECOM Acquisition Center - Adelphi, ATTN: AMSSB-ACA, 2800 Powder Mill Road, Adelphi, MD 20783-1197
- ZIP Code
- 20783-1197
- Solicitation Number
- W911QX-06-T-0140
- Response Due
- 8/23/2006
- Archive Date
- 10/22/2006
- Small Business Set-Aside
- N/A
- Description
- 1. This is a combined synopsis/solicitation for commercial items prepared in accordance with the format in FAR Subpart 12.6, as supplemented with additional information included in this notice. This announcement constitutes the only solicitation; p roposals are being requested and a written solicitation will not be issued. (i) The solicitation number is W911QX-06-T-0140. This acquisition is issued as a Request for Quotation. (ii) The solicitation document and incorporated provisions and clauses are those in effect through Federal Acquisition Circular 01-27. (iii) This acquisition is full and open competition. (iv) The following is a list of contract line item number(s) and items, quantities and units of measure, (including option(s), if applicable): CLIN 0001 Halide vapor phase etch tool in accordance with the description requirements below. Qty: 1, each. (v) Description of requirements: 1.0 General Description The required system is to be a commercially available halide vapor phase etch tool from a manufacturer that can accommodate and successfully perform selective etching on piece-parts and wafers from 3 inches up to 8 inches (75 to 200 millimeters) sizes. Th e system is necessary for performing isotropic, selective etching of sacrificial silicon dioxide for the release of Microelectromechanical system (MEMS) and other micro devices. The system should be able to process between one and three wafers simultaneou sly, and should contain strict safety features for HF vapor handling and detection. 2.0 Requirements and Specifications 2.1. The contractor shall provide a vapor phase etch system with computer control as follows: 2.1.1. Equipped with HF vacuum process chamber 2.1.1.1. Manual substrate loading mechanism 2.1.1.2. Process chamber accommodates: no less than three wafers (4 inch to 8 inch diameter) simultaneously 2.1.1.3. Process chamber pressure 2.1.1.3.1 Controllable by operator via software 2.1.1.3.2 Useable operating range of at least: 50 to 350 Torr 2.1.1.3.3 Base pressure: maximum: 30 millitorr. 2.1.1.4. Process chamber temperature: 2.1.1.4.1 Controllable by operator via software 2.1.1.4.2 Usable operating range of at least: 35 to 110 degrees Centigrade 2.1.1.4.3 Deviation from setpoint: maximum: plus or minus 1 degree Centigrade 2.1.1.5. Process gas flowrates: 2.1.1.5.1 Controllable by operator via software 2.1.1.5.2 HF flowrate usable range: 0 to 1000sccm 2.1.1.5.3 Nitrogen flowrate usable range: 0to 5000sccm 2.1.2. Silicon dioxide undercut performance should meet or exceed: 2.1.2.1. Etch rate variation: 2.1.2.1.1. Within a single wafer: no greater than: 3 percent 2.1.2.1.2. From wafer to wafer: no greater than: 4 percent 2.1.2.1.3. From run to run: no greater than: 5 percent 2.1.2.2. Vertical and lateral undercut etch rate: controllable by operator between a minimum rate of 100 nanometers per minute and a maximum of 10 microns per minute 2.1.2.3. Capable of etching sacrificial silicon dioxide layers as thin as 50 nanometers or as thick as 2 micrometers without stiction or residues 2.1.2.4. No attack of aluminum or gold metallization layers, and minimal attack of chromium adhesion layers 2.1.3. Gas supply/handling system: 2.1.3.1. Uses high purity, bottled anhydrous HF gas source and ultra-low water content alcohol catalyst converted to vapor phase and used for etching at low chamber pressure 2.1.3.2. HF source maintained below atmospheric pressure for safety 2.1.3.3. HF lines constructed of hasteloy tubing and heated to 50 degrees Centigrade (plus or minus 1 degree Centigrade) 2.1.3.4. HF and alcohol vapor detection/alarm/auto shut-off system with one part per million or better detectable limit to ensure operator safety 2.1.3.5. Matheson Tri-Gas Centurion gas cabinet for HF control, storage, and delivery 2.1.3.6. Gas cabinet equipped with menu-driven controls to facilitate operation 2.1.3.7. Gas cabinet equ ipped with LCD monitoring system to relay information pertaining to system status, pressure and weight readings, alarms, and operator prompts for gas cylinder maintenance. 2.1.3.8. 50/60Hz dry mechanical pump 2.1.3.8.1 Pump rate: minimum: 35 cubic feet per minute 2.1.3.8.2 Base pressure acheivable: no greater than: 30 millitorr 2.1.4. Computer interface requirements 2.1.4.1. Windows XP operating system 2.1.4.2. Video monitor 2.1.4.3. Optical Mouse 2.1.4.4. Keyboard 2.1.4.5. CD-RW drive for data storage 2.1.4.6. USB ports accessible from front of system for data storage 2.1.4.7. 3.5 floppy drive 2.1.4.8. RS-232 and IEEE interface 2.1.4.9. Up-grade software and hardware free of cost for a period of: no less than: three additional years from the date of acceptance. 2.2. The contractor shall deliver the vapor phase etch system to the U.S. Army Research Laboratory in Adelphi, Maryland. The contractor shall install the etching system and demonstrate full conformance to the requirements and specifications as defined in the Statement of Work. 2.3. The contractor will deliver the system only after ARL consultation and approval of the delivery. ARL technical expert will do pre-acceptance test at the equipment manufacturer site to verify compliance of the SOW. In no circumstances vendor will shi p the equipment without pre-certification. 2.4. The contractor will finish the installation, perform the SOW and certify that it is ready for the ARL operation within one week from the date of mutually agreeable date to start of installation. ARL will have full right to extend the date. 2.5. Contractor will provide on-site tool training and certification to users of the tool upon completion of system installation, SOW performance, and certification of tool operation. 2.6. If the contractor can not finish the job in the agreed time, it has to provide the same service at its own cost (including all transport and handling) at least for 1-wafers per day until the ARL system is ready and 100% certified to perform. 3.0 Documentation The contractor shall provide two complete set of operator and maintenance manuals on CD and clean room compatible hard copies. It will also provide all the additional documentation on any improvements in the soft/hard wares and operations for additional 3 -years at no cost. 4.0 Warranty The contractor shall provide a standard warranty to include parts and labor on the HF vapor phase etch system for a period of three years from the date of certification of full operational compliance with the Statement of Work. 5.0 Software The contractor shall provide software upgrades and maintenance necessary to the system for a period of three years from the date of demonstration of full operational compliance with the Statement of Work. 6.0 System Delivery Contractor must deliver system within an approximate timeframe of 1-3 months and/or agreed with mutual consent. 7.0 Value Engineering Clause Any future technical upgrades to the piece of equipment purchased under the original system would be free of charge to the U.S. Army Research Laboratory during the 3 year warranty period outlined above. After the three year warranty period potential cos ts associated with future technical upgrades would be negotiable between the contractor and the U.S. Army Research Laboratory. (vi) Delivery is required by 30 November 2006. Delivery shall be made to the Army Research Laboratory, 2800 Powder Mill Road, Adelphi, Maryland 20783. Acceptance shall be performed by an authorized Government Representative at the Government site. The FOB point is Destination. (vii) The following provisions and FAR/DFAR clauses can be obtained at http://www.arl.army.mil/contracts/opport.htm, http://farsite.hill.af.mil/VFFAR1.htm, or http://farsite.hill.af.mil/VFDFARa.htm. (viii) The provision at 52.212-1, Instructions to Offerors - Commercial, applies to this acquisition. (ix) The provision at FAR 52.212-2, Evaluation - Commercial Items is applicable to this acquisition. The specific best value evaluation criteria to be included in paragraph (a) of that provision are as follows: 1) The ability of the proposed product to meet t he salient characteristics as described in paragraph (v) above; 2) Past Performance. All offerors are to provide a documented history of providing similar systems. Submit the company name of the manufacturer and provide a point of contact and telephone number: and 3) Total Price. (x) Offerors shall include a completed copy of the provision at FAR 52.212-3, Offeror Representations and Certifications - Commercial Items, and DFARS 252.212-7000, Offeror Representations and Certifications -Commercial Items, with its offer. These clau ses can be obtained at http://www.arl.army.mil/contracts/opport.htm. (xi) The clause at 52.212-4, Contract Terms and Conditions - Commercial Items, applies to this acquisition. (xii) The clause at 52.212-5, Contract Terms and Conditions Required to Implement Statutes or Executive Orders - Commercial Items and DFARS 252.212-7001, Contract Terms and Conditions Required to Implement Statutes or Executive Orders Applicable to Defen se Acquisitions of Commercial Items, applies to this acquisition. The following additional FAR/DFARS clauses cited in this clause are applicable: 52.203-3, 52.222-3, 52.222-19, 52.222-21, 52.222-26, 52.222-35, 52.222-36, 52.222-37, 52.225-13, 52.232-33, 2 52.225-7001, 252.247-7023. (xiii) The following additional contract requirement(s) or terms and conditions apply: 52.004-4408, 52.005-4401, 52.032-4418, 52.045-4400. (xiv) The following notes apply to this announcement: None (xv) Offers are due on 23 August 2006, by 10:00 AM, Eastern Standard time, via email to rstoltz@arl.army.mil. For information regarding this solicitation, please contact Robin Stoltz, Contract Specialist, 301-394-3381, rstoltz@arl.army.mil.
- Place of Performance
- Address: RDECOM Acquisition Center - Adelphi ATTN: AMSSB-ACA, 2800 Powder Mill Road Adelphi MD
- Zip Code: 20783-1197
- Country: US
- Zip Code: 20783-1197
- Record
- SN01110459-W 20060811/060809221405 (fbodaily.com)
- Source
-
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